摘要
基片镀膜是氘/氚靶制备过程的重要工序,靶膜的性能直接影响充氘及中子实验。本文对去除表面污渍和氧化层后的基片采用磁控溅射进行镀膜,研制性能优良的强流氘氚中子源用靶膜。采用扫描电镜观察膜层表面外观形貌,根据称重法用电子天秤测量理论膜厚,使用划痕仪分析膜层结合力,并通过电子探针分析膜层的杂质元素含量来表征靶膜的性能。结果表明,磁控溅射镀膜后膜层颗粒度细小、分布均匀,同时膜层表面杂质小于6.0%。镀膜后基片的活化充氘实验表明,氘/钛(原子比)最高可达1.98,满足中子产额实验要求,可进行后续中子实验。
Substrate coating is an important process in the preparation of deuterium/tritium target.The performance of target film directly affects deuterium charging and neutron experiments.The uniformity of film thickness,film adhesion and impurity elements will affect the amount of deuterium in the process of deuterium/tritium charging,and even losing efficacy of the target.Magnetron sputtering coating is benefit to the film coating with high compactness and adhesion,which is suitable for deuterium/tritium target coating process.In this paper,coating was carried out through magnetron sputtering after removing grease,dirt and oxide layer of the targets.The coating of dense film,transition film and functional film were realized by changing the power density of the vacuum coating machine.The coating thickness was determined by changing the coating time.The target film for high current deuterium and tritium neutron source with uniform film thickness and high binding force was developed.The size range of coated substrate was Φ15mm to Φ500mm.The theoretical coating thickness was measured by weighing method through electronic balance.The micro morphology of the film was observed by scanning electron microscope,so as to measure the actual thickness of the film.The adhesion of the film was analyzed by scratch tester.The content of impurity elements in the film was analyzed by electron microprobe to characterize the performance of the target film.The scanning electron microscope results show that the particle size of the film is fine and evenly distributed,and the particle size is in the range of 0.19μm to 0.93μm.The actual film thickness measured by electron microscope is basically consistent with the theoretical film thickness measured by electronic scale,indicating that the coating has high compactness.The results of electron microprobe show that the impurity elements on the surface of the film are C,O and Fe.The total content of impurity elements is less than 6.0%.Φ200 mm andΦ500 mm substrates were coated and the theoretical film thicknesses were analyzed.The film thickness error at different positions of the same substrate is less than±5%,showing that the film thickness is uniform at all points of the film layer.The activation deuterium charging experiment was carried out on the coated substrate.The results show that the deuterium/titanium(atomic ratio)reaches up to 1.98.The phenomenon of falling off the film in the process of deuterium charging does not occur,which meet the requirements of neutron experiment.Subsequent neutron experiments can be carried out.
作者
梁斌斌
巴伟伟
王子默
彭怡刚
高翔
刘超
LIANG Binbin;BA Weiwei;WANG Zimo;PENG Yigang;GAO Xiang;LIU Chao(HTA Co.,Ltd.,Beijing 102413,China)
出处
《原子能科学技术》
EI
CAS
CSCD
北大核心
2022年第S01期265-271,共7页
Atomic Energy Science and Technology
基金
中核集团“青年英才”项目
关键词
氘/氚中子源
靶膜
TiD_(2)
磁控溅射镀膜
deuterium and tritium neutron source
target film
TiD_(2)
magnetron sputtering coating film
