摘要
Modulation of Si-O bonds under mild conditions has been a challenging issue in the field of material science,which is critical to manufacture highperformance silica-based optical and photonic devices.Herein,we introduce a nondestructive technique to achieve Si-O bond rearrangement,leading to plastic deformation and photoluminescence enhancement of amorphous silica nanoparticles using supercritical carbon dioxides in EtOH/H_(2)O solution under mild temperature.Specifically,plastic deformation is achieved by treating hollow mesoporous silica nanospheres using supercritical CO_(2)at 40°C under 20 MPa.Experimental and theoretical studies revealed the critical role of supercritical CO_(2)in the plastic deformation process,which can be intercalated into the hollow mesoporous silica nanospheres with anisotropic stresses and induces the rearrangement of Si-O bonds and transformation of ring structures.This work suggests a novel approach to engineer high-performance nano-silica glass components for numerous optical and photonic devices under mild condition.
基金
the National Natural Science Foundation of China(Nos.51173170,21703207,21773216)
the joint project from the Henan-Provincial and the China-National Natural Science Foundations(Project No.U2004208)
