摘要
采用脉冲激光沉积技术在不同气氛和氧分压下,在抛光石英片上生长了一系列(200)面择优取向的Nd∶LuVO4薄膜。利用X射线衍射(XRD)分析了所制备薄膜性能,认为成膜较为适宜的气氛为氧气,且氧分压为20Pa时所得到的薄膜性能较好。利用原子力显微镜(AFM)观察了Nd∶LuVO4薄膜的表面形貌,分析了氧分压的存在对薄膜表面质量的影响。利用卢瑟福背散射(RBS)分析了薄膜的组成,发现薄膜的成分组成与靶材的成分较为一致。利用棱镜耦合法测得了该薄膜中每条模所对应的有效折射率为2.0044和1.7098。
The (200) dominated (Nd∶LuVO_4) films were fabricated successfully on polished SiO_2 under different ambient gases and different oxygen pressures. By XRD, it is shown that a film with good crystallization is deposited under oxygen and the optimal pressure is 20 Pa. The surface morphology of (Nd∶LuVO_4) films was observed by AFM, and it is found that oxygen pressure influences the surface morphology of (Nd∶LuVO_4) films. The ratio of content of (Nd∶LuVO_4) films was estimated according to the yields of Lu an...
出处
《中国稀土学报》
CAS
CSCD
北大核心
2005年第4期455-458,共4页
Journal of the Chinese Society of Rare Earths
基金
国家重大基础研究(973)计划项目资助(2004CB619002)
