摘要
硬质涂层对工件表面改性已经成为现代先进制造加工行业越来越重视的工艺,工件一般为复杂外形,保证工件表面涂层性能结构的一致性尤为重要,为此,必须研究工件与靶源之间的相对位置对涂层结构性能影响的关系,为涂层工艺的工程化应用提供理论依据。本文采用射频反应磁控溅射分别在高速钢和单晶硅片基体上沉积了氧化铬薄膜,研究了样品表面与靶表面相对取向对涂层的相结构、表面和断面形貌、力学性能、生长模式等因素的影响。结果表明溅射方法沉积涂层的临界角度为45°,该临界点决定了涂层的性质与生长模式。
The chromium oxide coatings were deposited by RF reactive magnetron sputtering on substrates of Si(100)and irregularly-shaped high-speed stainless-steel work-piece.The coatings were characterized with X-ray diffraction(XRD)and scanning electron microscopy(SEM)to understand the influence of the coating conditions on its microstructures and its mechanical properties.The results show that the sputtering angle considerably affects the microstructures,surface morphology,mechanical properties,and growth mode of t...
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2008年第S1期13-16,共4页
Chinese Journal of Vacuum Science and Technology
关键词
溅射角
显微结构
反应磁控溅射
氧化铬薄膜
Deposition surface inclination angle
Microstructure
Reactive magnetron sputtering
Chromium oxide coating
