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蓝宝石衬底上磁控溅射法室温制备外延ZnO薄膜 被引量:7

Room Temperature Epitaxial Growth of ZnO Thin Film on Sapphire Substrates by RF Magnetron Sputtering
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摘要 在室温条件下,采用磁控溅射方法在蓝宝石(0001)衬底上制备了外延的ZnO薄膜。采用原子力显微镜(AFM)、X射线衍射仪(XRD)、可见-紫外分光光度计系统研究了ZnO薄膜微观结构和光学特性。AFM测量结果表明ZnO薄膜具有较为均匀的ZnO晶粒,表面平整,具有较小的均方根粗糙度(0.9 nm);X射线衍射结果表明制备的ZnO薄膜为具有六角纤锌矿结构的外延薄膜;光学透射谱显示样品在可见光范围内具有较高的透过性,并在370 nm附近出现一个较陡的吸收边,表明在室温下制备出了具有较高质量的ZnO薄膜。 Epitaxial ZnO thin film has been fabricated on sapphire substrate(0001) using RF magnetron sputtering at room temperature.The microstructural and optical properties of ZnO film were investigated by atomic force microscope(AFM),X-ray diffraction(XRD),Vis-UV spectrophotometer at room temperature.The AFM measurement shows that the uniform grain sized ZnO film is very smooth with root mean square roughness of 0.9 nm.XRD results indicate that the ZnO film grown on sapphire is epitaxial with wurtzite structure.Ro...
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2009年第1期74-78,共5页 Journal of Synthetic Crystals
基金 973前期专项项目(No.2007CB616910) 国家自然科学基金(No.50572021) 河北省自然科学基金项目(No.E2008000620,No.A2005000090) 教育部基金项目(No.2005-546,207013) 河北大学青年基金(No.2005Q08)
关键词 ZNO薄膜 射频磁控溅射 外延生长 ZnO film RF magnetron sputtering epitaxial growth
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参考文献10

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同被引文献89

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