摘要
PZT薄膜的微图形化是制备基于PZT薄膜微传感器和微驱动器的关键技术之一。通过引入雾化技术,改进了传统的PZT薄膜湿法刻蚀方法,进一步减小了薄膜微图形的侧蚀比,提高了图形的转化精度。选用体积比为1∶2∶4∶4的BHF/HCl/NH4Cl/H2O溶液作为刻蚀液,对溶胶-凝胶法制备的1μm厚PZT薄膜作雾化湿法刻蚀,刻蚀速率为28 nm/s,侧蚀比为0.5∶1。对所得样品表面区域进行EDS分析表明,所得PZT薄膜图形表面无残留物,该工艺可用于MEMS领域中PZT薄膜的微图形化。
Micro-patterning of PZT thin film is one of the key technologies in the fabrication of micro-sensors and micro-actuators made of PZT films. A spray technique was developed to improve the traditional way of wet etching, reduce the undercutting of micro pattern and enhance the precision of transferring pattern. PZT films of thickness of about 1 μm prepared by the sol-gel method were wet-chemically patterned in a sprayed solution which was formed by 1:2:4:4 of BHF:HCl:NH4Cl:H2O(volume ratio). The results show that the etch rate is 28 nm/s and the undercutting is 0.5:1. The surface of the samples was investigated by energy disperse spectroscopy (EDS), the results showed there are no residues on the patterned surface and this technique is suitable for the patterning of PZT thin films in MEMS field.
出处
《微细加工技术》
EI
2006年第4期25-28,共4页
Microfabrication Technology
