摘要
采用NiFeNb为种子层,制备(Ni82Fe18)1-xNbx(35 )/(Ni82Fe18)(150 )/Ta(30 )系列膜,并对其颗粒大小和磁滞回线等进行测量,探讨种子层中Nb含量x对坡莫合金磁滞回线的影响.结果表明:以NiFeNb作种子层能更好地改善坡莫合金的微结构.种子层厚度为20 ,Nb含量为24 4%时,磁滞回线有最小的回线面积、矫顽力和较小的不对称性.种子层影响坡莫合金磁滞回线的一个重要原因是脱附激活能等因素造成种子层具有不同的表面粗糙度,进而使坡莫合金具有不同的微结构.
The (Ni_(82)Fe_(18))(_(1-x)Nb_x)(35 ?)/Ni_(82)Fe_(18)(150 ?)/Ta(30 ?) films with the seed layer are prepared. The grain size and hysteresis loops of samples are measured and variations of hysteresis loops with the Nb atomic concentration in the seed layer are analysed. The influence of the seed layer on hysteresis loops is studied. The results show the microstructure of the permalloy films grown on the seed layer is improved and the technological conditions, in which one is the Nb atomic concentration x influence on the hysteresis loops of the permalloy films. The area of the loop and the coercivity in the hysteresis loop when d=20 ? and x=24.4%. One of important reasons why the seed layer influences on the hysteresis loops is that different excited energy at all results in different roughness on the face of the seed layer film, then different microstructure of the permalloy films.
出处
《西南师范大学学报（自然科学版）》
CAS
CSCD
北大核心
2004年第4期607-612,共6页
Journal of Southwest China Normal University(Natural Science Edition)
基金
重庆市科委资助项目(2003-6111).
