期刊文献+

氩氧比和工作压强对溅射AZO薄膜光电学性能的影响

Influence of Argon oxygen ratio and working pressure on optoelectronic performance of sputtering AZO thin films
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摘要 文章采用射频磁控溅射法在普通玻璃基片上制备AZO透明导电薄膜。用紫外-可见分光光度计和四探针测量了不同氩氧比和工作压强下制取样品的光学和电学性能。结果表明,所制备的AZO薄膜在可见光范围内的平均透过率约为80%;薄膜的电阻率随着工作压强的变化呈现一定的变化规律,得到的薄膜最低方块电阻约为290Ω/□。 Transparent conducting aluminum-doped zinc oxide(AZO)thin films have been deposited on common glass substrates by RF magnetron sputtering method in this paper.The optical and electrical properties of the films deposited at different argon oxygen ratio and working pressure were investigated by UV-VIS spectrum and four-point probe measurements.It has been found that all the AZO films are transparent with an average of 80% transmittance,within the visible wavelength region.The resistance of the films is regular in a certain degree with the changes of working pressure,Among all the films,the minimum sheet resistance gets about 290 Ω /□.
作者 刘持 彭新村
出处 《湖南农机》 2014年第1期77-78,82,共3页 Hunnan Agricultural Machinery
关键词 AZO透明导电膜 射频磁控溅射 透光率 方阻 AZO transparent conductive film radio frequency magnetron sputtering light transparence sheet resistance
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