摘要
建立了面向复杂光学表面的大气等离子抛光系统,并用该系统进行硅片表面加工的实验研究。研究了CF4、SF6两种气体的放电特性以及加工效果,得到了加工速率与功率,流量间的关系,并通过原子力显微镜观察了加工后的表面质量。
The atmospheric pressure polishing system of complex optical surface was established. The experimental study on machining of silicon wafer surface was made by using this system. The discharge characteristics and machining effect of CF4 and SF6 were researched. The relationship between machining rate and power & flow was gotten by experiment. The quality of machined surface was observed by atomic force microscope (AFM).
出处
《航空精密制造技术》
2010年第1期9-11,19,共4页
Aviation Precision Manufacturing Technology
关键词
复杂光学表面
大气等离子体
抛光
complex optical surface
atmospheric pressure plasma
polishing
