摘要
研究了铬膜和铌膜的复合对锆合金基体上制备的直流磁控溅射薄膜附着性的影响。使用扫描电镜(SEM)观察了膜层界面,用原子力显微镜(AFM)观察了膜层表面,用划痕法测定了薄膜的附着性。结果表明:膜/基界面结合良好,界面成分升降区狭窄;铬膜与铌膜组成的复合薄膜结合紧密;铬膜的组织为致密、边界孔洞少的纤维状晶粒,铬膜厚度为2 靘时,晶粒仍为亚微米级,但晶粒顶面已出现拱形;膜厚同为2 靘时,外层1 靘铌膜+内层1 靘铬膜组成的复合膜的附着性分别是外层1 靘铬膜+内层1 靘铌膜组成的复合膜的2.35倍、2 靘铬膜附着性的3倍,其原因在于膜层组织及力学性能变化、铌膜韧性好和复合顺序。因此,依靠铬膜厚度的增加来提高铬膜保护性的方法具有较大局限性,通过在一定厚度的铬膜外复合铌膜的方法则有较好的可行性。
To use chromium thin films to improve properties of zirconium alloy, some effects of composite films of niobium layer and chromium layer have been studied. The interface was studied with scanning electron microscope (SEM), the grain morphology of chromium film surfaces were observed with atomic force microscope (AFM), scratch adhesion tests were performed on a WS-97 Automatic Scratch Tester to examine the adhesion of films to its substrate. The results showed that interface of films/substrates is well-knit, so do the interfaces of niobium layer and chromium layer. No compound or interphase was found, though there are visible boundary. The grains of 2 mum thickness chromium films behave the compact fine fibre grains with vaulted top and the grains sizes is less than microns. When the thickness of films layer is 2 mum, it is found out that the adhesion of the film (1 mum Nb+1 mum Cr+Zr substrates) is 2.35 times that of the film' (1 mum Cr + 1 mum Nb + Zr substrates) and 3.0 times the film' (2 mum Cr + Zr substrates), for the reason is the changes of structure and performance, order of layers and better toughness of niobium's. Therefore, a niobium layer deposited on the chromium films outside is better way to improve films performance rather than add of the thickness of chromium films.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2004年第6期598-601,共4页
Rare Metal Materials and Engineering
基金
核燃料及材料国家级重点实验室基金资助(51481080101SC0101)
关键词
锆合金
铬膜
铌膜
复合
附着性
zirconium alloy
chromium film
niobium film
adhesion
composite film
