摘要
研究了真空阴极电弧法沉积 TiN 超硬膜的工艺和应用.结果表明,氮气分压强和负偏压对膜层的结构和性能有很大影响,在氮气分压强为1.30Pa,负偏压为—300V 时沉积的膜层表面"钛滴"少,膜层致密,为细柱状晶和粒状晶结构,具有(220)和(111)织构,硬度可达到 Hv2100以上,涂层钻头寿命达到了未涂覆涂层钻头的6.7倍.
The process and application of TiN superhard films deposited by vacuum cathodic arc is studied.Results indicate that nitrogen partial pressure and negative bias voltage have significant influence on the structure and properties of the films.Under the conditions that the nitrogen partial pressure is 1.30 Pa and Nega- tive bias voltage is—300V,dense films were deposited with few Ti droplets on the surface of the films,thin columnar and equiaxial crystal structure and texture of (220)and(111).The mierohardness of the films can reach up to Hv 2100 and the service life of coated drills is 6.7 times that of uncoated ones.
出处
《广东有色金属学报》
1993年第1期44-49,共6页
Journal of Guangdong Non-Ferrous Metals
关键词
真空阴极
电弧沉积
氮化钛
超硬膜
vacuum cathodic arc deposition
titanium nitride superhard films
