摘要
稻壳在稀盐酸中沸煮、干燥后,于540℃煅烧,制得了一种高纯高表面积SiO2。ICP-AES测定结果表明了该SiO2中杂质的质量含量为5.6×10-6,激光粒度仪测定其体积平均粒径为19.67μm,BET法研究表明了它的比表面积为280m2/g。并利用XRD研究了稻壳在制备过程中的结构变化。
SiO_2 with high purity and high specific surface area was prepared from rice husk by boiling in dilute hydrochloric acid, drying and then calcining at 540℃. The SiO_2 content of the product is 99.99%(w/%) and the impurity content is 5.6×10^(-6). The average particle size is 19.67μm, and the specific surface area is 280 m^2/g. The structure transformation of the rice husk was investigated by XRD during preparation.
出处
《化学世界》
CAS
CSCD
北大核心
2004年第9期458-460,469,共4页
Chemical World
基金
江苏省教育厅自然科学基金资助项目(02KJB430006)
关键词
稻壳
高纯二氧化硅
比表面积
制备
rice husk
high purity SiO_2
high specific surface area
preparation
