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二维变线距光栅密度的检测 被引量:1

Measurement of Two-dimensional Varied-line-space Gratings
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摘要 变线距全息光栅平面单色仪由于具有自动聚焦、消像差、高分辨率以及减少杂散光等能力,因而在同步辐射装置、激光核聚变装置以及太空望远镜等设备中有着重要的应用。由于变线距全息光栅的制作及检测存在着相当的难度,制约了变线距全息光栅的推广应用。因此,变线距全息光栅的制作及检测研究,具有十分重要的理论及应用意义。变线距全息光栅的制作必须有高精度的密度检测技术相配合。比如,在变线距全息光栅的制作过程中,需要对用于形成变线距光栅的全息干涉条纹的线密度进行检测;对于已经制成的变线距全息光栅的线密度也需要进行检测,以检查光栅的制作质量。因此,变线距全息光栅线密度的检测,对提高变线距全息光栅的制作质量起着十分关键的作用。文中给出了二维变线距光栅的密度描述公式,讨论了干涉条纹的物理意义;应用干涉云纹法和条纹图像处理技术,对二维变线距光栅的密度分布进行了检测研究,给出了光栅密度的全场分布,并讨论了检测精度。 Owing to its ability of focusing automatically, eliminating aberration, high resolution and less stray light, the plane monochromator of variable line space (VLS) with grating holographic recording has significant applications in synchrotron radiation devices, laser fusion equipments, space telescopes, and etc. VLS grating has been restrained in its widespread availability due to the difficulties in fabricating holographic gratings and measuring their line density. Therefore the study on fabrication and measurement of VLS grating with holographic recording plays an important role in both theory and application meanings. The fabrication is closely concerned with high accurate measurement techniques. For example, the line density of holographic interfering fringes which are used to form VLS grating should be measured during the process of VLS grating manufacture, the line density of the manufactured grating should be measured to detect the quality of the gratings. Therefore, the line density measurement of VLS gratings with holographic recording is vital for fabricating gratings and guaranteeing the quality of the products. In this study, the density expression of two-dimensional varied-line-space gratings was presented and the physics meaning of interference fringes was interpreted. With Morie interferometry and the fringe image processing techniques, the experiments with a two-dimensional varied-line-space grating wre carried out, the grating density distribution is given, and the measurement accuracy is discussed.
出处 《实验力学》 CSCD 北大核心 2004年第3期324-328,共5页 Journal of Experimental Mechanics
基金 国家自然科学基金资助项目 批准号:10272098
关键词 全息光栅 变线距光栅 全息干涉条纹 二维 线密度 激光核聚变装置 场分布 检测研究 配合 制作 varied-line-space gratings line density Morie interferometry fringe image process
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参考文献8

  • 1Namioka T, Koike M. Aspheric wave-front recording optics for holographic gratings [J]. Appl. Opt., 1995, 34:2180-2186
  • 2王炜,杨厚民.平面变栅距光栅的原理及设计[J].光学学报,1999,19(9):1158-1162. 被引量:13
  • 3Deville B, Bonnemason F, et al. Holographically recorded, ion etched variable line space gratings [C]. San Diego: Proc.SPIE, 1998, 3450:24-354
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  • 5时轮,郝德阜.变栅距衍射光栅的原理及应用[J].光学精密工程,2001,9(3):284-287. 被引量:35
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  • 8Ma Li,Han Yun,Wang Ru,et al. Image Processing For Shearing Interferometer Fringe atterns [C]. Proc. SPIE,2002, 5058:548-553

二级参考文献12

共引文献39

同被引文献7

  • 1王铷,唐欣,张天林,王迪,何世平.应用相移干涉云纹检测变线距光栅密度[J].中国科学技术大学学报,2004,34(5):568-574. 被引量:2
  • 2Hettrick M C, Bowyer S. Varied line-space gratings: new designs for use in grazing incidence spectrometers[J]. Appl. Opt., 1983, 22:3921~3924
  • 3Abramson N. Principle of least wave change[J]. J. Opt. Soc. Am.,1989, A6:627~629
  • 4Namioka T, Koike M. Aspheric wave-front recording optics for holographic gratings[J]. Appl. Opt., 1995, 34:2180~2186
  • 5Deville B, Bonnemason F, et al. Holographically recorded, ion etched variable line space gratings[C].San Diego: Proc.SPIE, 1998, 3450:24~354
  • 6Ma Li,Han Yun,Wang Ru,He Shiping. Image Processing For Shearing Interferometer Fringe atterns[J]. Proc. SPIE,2002, 5058:548~553
  • 7王炜,杨厚民.平面变栅距光栅的原理及设计[J].光学学报,1999,19(9):1158-1162. 被引量:13

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