摘要
讨论利用直线型过滤电弧制备TiAlN薄膜中,过滤磁场作用于弧斑、靶中毒现象,电子和离子的回流和叠加偏压等因素影响作用的大小进行了实验分析.结果表明,磁场对弧斑分裂和弧斑运动速度的综合作用最为显著是由于直线型过滤电弧形成的瓶颈磁场造成的电子和离子的回流,以及直流叠加脉冲偏压形成的放电空间的等离子体磁撞,分解和离化的所起的共同作用的结果.这对于控制电弧离子镀沉积薄膜中的颗粒尺寸和颗粒密度,指定合理的工艺参数有一定的指导作用.
In this study the mechanism of suppression and elimination droplets of various factors in line magnetic filtering devices was discussed in are plating TiAlN films deposition, including effect of magnetic on arc spot, target toxic, circumfluence of electron and ion and overlapping bias. The acting contents of several factors were an alyzed by experimental. It shows that effects of filter magnetic on split and movement speed of are spot are most remarkable. This is extremely useful for controlling the size and density of macroparticles in practical production.
出处
《材料科学与工艺》
EI
CAS
CSCD
2004年第3期268-271,共4页
Materials Science and Technology
基金
中国科学院兰州化学物理研究所固体润滑国家重点实验室基金资助项目(01-03).
