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掺硼CVD金刚石的电加工表面分析 被引量:1

Analysis on Electromachinied Surface of B-Doped CVD Diamond Film
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摘要 金刚石具有一系列独特的力学、热学、声学、电学、光学和化学性能,在高科技领域具有广阔的应用前景。普通CVD金刚石膜是高度绝缘的,不能采用如电火花等加工导电聚晶金刚石(PCD)的方法和设备对其进行加工。本文通过掺硼实现了金刚石膜的导电,开展了电火花成型和线切割的实验研究,并通过SEM、Raman分析和粗糙度测量对加工后的表面进行了分析。 Diamond has found its wider and wider applications in the field of high technology due to its excellent properties in mechanical, electrical, thermal, optical, acoustical and chemical aspects.Diamond film un-doped is highly insulated so that it can not be processed by electrical discharge machining (EDM) method, which is used widely in machining of PCD.In this paper, CVD diamond thick film was made conductive by boron-doping , and EDM shaping and wire cut were studied experimentally to process B-doped diamond thick film. Its electromachined surface was analyzed by means of SEM, Raman and Roughness Measurement.
出处 《苏州大学学报(工科版)》 CAS 2004年第5期78-80,共3页 Journal of Soochow University Engineering Science Edition (Bimonthly)
基金 国家自然科学基金资助项目(50075039)。
关键词 掺硼CVD金刚石 导电 电火花成型 线切割 粗糙度 表面质量 chemical vapor deposition diamond thick film electromaching boron-doping
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参考文献3

  • 1Ahmed Gadalla. EDMing Ceramics and Composits[J]. Cutting Tool Engineering,1993.
  • 2Zuo Dunwen,Li Xiangfeng, Xu Feng, et al. Smoothing of Thick Diamond Film Prepared by Electron-Assisted CVD[J]. Key Engineering Materials, 2004, 258-259: 507-511.
  • 3Liu Yonghong,et al. Compound Process Electuecally Sharps Polycrystalline Diamond Quickly[J].Advanced Manufacturing Technology,1993,14:12-16.

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