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制备氧压对外延锆钛酸铅铁电膜疲劳行为的影响

EFFECT OF DEPOSITION OXYGEN PRESSURE ON THE FATIGUE BEHAVIOR OF EPITAXIAL PB(Zr_(0.52) Ti_(0.48) )O_3 THIN FILMS
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摘要 :利用脉冲激光沉积方法 ,在外延的具有钙钛矿结构的 La0 .35 Nd0 .35 Sr0 .3Mn O3导电膜上生长外延的铁电薄膜 Pb( Zr0 .5 2 Ti0 .48) O3。通过改变制备氧压控制铁电膜中氧的空穴浓度 ,研究其对 Pt/ Pb( Zr0 .5 2 Ti0 .48) O3/La0 .35 Nd0 .35 Sr0 .3Mn In this work,with the use of La 0.35 Nd 0.35 Sr 0.3 MnO 3 as bottom electrode,epitaxial Pb(Zr 0.52 Ti 0.48 )O 3 ferroelectric thin films have been fabricated by pulsed laser deposition.By changing the deposition oxygen pressure,oxygen concentration in the Pb(Zr 0.52 Ti 0.48 )O 3 films was controlled and its effect on the fatigue behavior of the ferroelectric films was investigated.
作者 陈效军
机构地区 安徽广播电视大学巢湖分校
出处 《安徽建筑工业学院学报（自然科学版）》 2000年第2期46-48,共3页 Journal of Anhui Institute of Architecture(Natural Science)
关键词 铁电薄膜 锆钛酸铅 氧压 钙钛矿结构 导电膜 脉冲激光沉积 空穴 外延 ferroelectric film,fatigue
分类号 TU43 [建筑科学—岩土工程] TM282 [一般工业技术—材料科学与工程]
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参考文献10

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安徽建筑工业学院学报（自然科学版）
2000年 第2期

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