摘要
将光刻胶涂敷在带有 ITO薄膜的玻璃表面上,利用紫外光对其进行光刻,通过金相显微镜观察刻蚀后的 ITO表面形貌,定性地讨论各个工艺的不同对刻蚀后的电极的影响,得到最佳清洗工艺为:洗涤剂棉球擦洗,然后分别用丙酮、蒸馏水超声清洗两次,烘干;对于正性光刻胶RZJ 390PG,最佳实验效果的曝光时间为5 min;最佳显影时间为 2 min;最佳刻蚀时间为6 min,为OLED得到精细阳极奠定了基础。
Photoetching glue is coated on the surface of ITO-coated glass and achieved by exposing to UV lamp. The metallography microscope is carried out to observe the surface morphology after photoetching. The influence of main process variations on electrode has been qualitatively studied. After analyzing the results, a proposed fabrication process for RZJ-390PG is given as follows: cleaning in acetone and distilled water by ultrasonic and drying in the oven; the optimal exposure time is 5 min; the optimal developing time 2 min; the optimal etching time 6 min. The techniques can be applied to fabrication of fine anode of OLED.
出处
《液晶与显示》
CAS
CSCD
北大核心
2005年第1期22-26,共5页
Chinese Journal of Liquid Crystals and Displays
基金
国家自然科学基金资助项目(No.50372038)
关键词
ITO
光刻
曝光时间
显影时间
刻蚀时间
ITO
photoetching
exposure time
developing time
etching time
