摘要
运用直流磁控溅射技术,在加温与具有偏压的硬质合金与奥氏体不锈钢衬底上,在N_2与Ar压强比在3%～13%内沉积TiN薄膜。对这种TiN薄膜的机械与光学性能作了研究,测定了它们的表面粗糙度、显微硬度可达23520N/mm^2和划刻临界负载可达80N,给出了TiN薄膜晶格常数变化与SEM的断面形貌图。测定了两种基体上TiN薄膜的近于垂直的镜反射率、漫反射率与总反射率。还确定了TiN薄膜的光学常数n—折射率,k—消光系数。
The TiN thin films were deposited on the two substrates of hardmetal and austenitic steel by using DC. magnetron reactive sputtering with N_2/Ar pressure ratio range of 3%～13%, heated substrates and bias. The mechanical and optical properties of sputtered TiN thin films have been investigated. Microhardness and scratch critical load of TiN thin films are up to 23520N/mm^2 and 80 N, respectively. Cell dimensions and fracture cross section of the films were obtained by x-ray investigation and SEM. Near normal specular, diffuse and total reflectance of TiN thin films on two substrates were measured at 0.35-2.5μm wavelength range. The optical constants, n-refractive index, k-extinction coefficient of TiN thin films were determined by T-R method.
出处
《真空科学与技术》
CSCD
1993年第2期116-123,共8页
Vacuum Science and Technology
关键词
溅射
薄膜
氮化钛
性质
Magnetron sputtering, Micro-hardness, Scratch critical load, Optical constant
