摘要
本文描述硅光波导技术的重大突破：（１）用ＳＩＭＯＸ技术代替传统的硅外延型光波导，解决了衬底吸收光波．从而显著改善了光波导的传播损耗．（２）在理论及实验上均已解决用调整脊形的高宽比（高宽均能达１０微米左右），制取单模脊形光波导．这种光波导的下覆盖层是ＳｉＯ２，传播损耗小；断面积大，和单模光纤耦合良好．满足了光集成技术中对光波导的几项重要要求．
Abstract This paper presents the major breakthrough of manufacturing all-siliconwaveguide technique:(1) Use the SIMOX technique instead of old epitaxy waveguideto avoide the light absorption of the substrate to improve and the propagation loss.(2)From the theory and experiment, it is possible to prepare the single-mode ribwaveguide through adjusting the ratio of width and height and their dimensionscan be about 10 microns. The down cladding layer of such waveguide is silicon dio xide, and the propagation loss is much smaller. Besides. it is easy to match withsinglemode fibre due to large cross section. It satisfies several requirements for agood optical waveguide in optical integration.
基金
国家自然科学基金
