摘要
利用ＬＢ技术，以二十碳酸作辅助成膜材料，在疏水处理的Ｐ－Ｓｉ上分别制备了２、４、６、１０和２０层聚乙烯咔唑（ＰＶＫ）超分子膜。对这种体系的表面光电压谱（ＳＰＳ）研究结果表明，表面光电压随ＰＶＫ膜层数的增加而增强，在紫外区增强较为明显。随着膜层数的增加，表面光电压有趋于饱和的趋势。膜对基底的敏化主要是由于ＰＶＫ的光导电性引起的。
With arachidic acid used as auxiliary, 2, 4, 6, 10 and 20 layers polyvinylcarbazole(PVK ) supermolecule films were prepared on hydropsobic p-Si plates by means of LBtechnique. Investigations of surface photovoltage spectra (SPS) showed that the SPS intensity of PVK films/p-Si increased with the increase of layers. In ultraviolet region SPS increased significantly. With the increase of layers, SPS tended to a threshold. The Photoconductivity of PVK played a key role in photosensitization.
出处
《光谱学与光谱分析》
SCIE
EI
CAS
CSCD
北大核心
1994年第3期49-52,共4页
Spectroscopy and Spectral Analysis
关键词
超分子膜
表面光电压谱
聚乙烯咔唑
LB technique, Supermolecule films, Surface photovoltage spectra, Polyvinylcarbazole
