摘要
以锌、铝合金 (ω(Al) =3% )为靶材 ,利用直流反应磁控溅射法制备了系列掺铝氧化锌ZnO :Al(ZAO)薄膜样品 ,通过X射线衍射 (XRD)、扫描电子显微镜(SEM)、分光光度计、霍耳效应及红外发射率测量仪等测试仪器或方法表征了样品的结构、形貌、光学、电学及红外发射特性 .测得样品最低电阻率达到 1 .8× 1 0 -6(Ω·m) ,最大禁带宽度为 3.47eV ,可见光区平均透过率达到 90 % ,8～ 1 4μm波段平均红外发射率在 0 .2 6～ 0 .9之间 .上述特性均随衬底温度和溅射功率的变化有着规律的变化 .当方块电阻小于 45Ω时 ,薄膜在 8～ 1 4μm波段平均红外发射率与方块电阻遵循二阶函数变化规律 .
Aluminium-doped zinc oxide (ZnO:Al) films were deposited on glass substrate by DC reactive magnetron sputtering from a Zn-Al metallic target (ω(Al)=3%). Films with novel, tangly string-like surface morphology, an average optical transmittance up to 90% in the visible range, a widest band gap of 3.47?eV and electrical resistivity down to 1.80×10 -6 ?Ω·m were obtained. The infrared emissivity in 8～14?μm waveband is distributed in the range of 0.26～0.9. The surface morphology, crystallinity, infrared emissivity as well as the electrical and optical properties of the samples were characterized using X-ray diffraction, scanning electron microscopy, spectrophotometry, infrared radiometer and Hall-effect measurement. The optical, electrical and infrared emissing properties of the films depend on substrate temperature and sputtering power obviously and regularly. The relationship between sheet resistance and infrared emissivity of ZnO:Al(ZAO) thin films follows a quadratic function as the sheet resistance is below 45?Ω.
出处
《北京航空航天大学学报》
EI
CAS
CSCD
北大核心
2005年第2期236-241,共6页
Journal of Beijing University of Aeronautics and Astronautics
关键词
透明导电薄膜
磁控溅射
ZNO:AL薄膜
方块电阻
禁带宽度
红外发射率
transparent conductive oxides thin films
magnetron sputtering
ZnO:Al thin films
sheet resistance
forbidden bands
infrared emissivity
