摘要
本文讨论了ＩＴＯ膜的稳定性和刻蚀特性。比较了多种ＩＴＯ膜的刻蚀液，得出加热至１００℃的４５％ＨＩ溶液和加热至５０℃的ＨＣＩ和ＨＮＯ３的混合溶液人的刻蚀特性较为理想。
Abstract The chemical stability and etching property of indium tin oxide films are discussed in this paper.Some etchants of ITO thin film are compared and it was found that the 45 %HI solution heated to 100℃ and the HCl:HNO3:H2O heated to 50℃ are very ideal etchants.
出处
《真空》
CAS
北大核心
1994年第5期25-27,共3页
Vacuum
