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使用AFM测量纳米尺度线宽的不确定度研究 被引量：4

Uncertainty in Nano-scale Linewidth Measurements Using Atomic Force Microscope
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摘要 针对NanoscopeIII型原子力显微镜,进行了纳米尺度线宽测量的不确定度分析。提出一个线宽测量的误差校正步骤,确定并分析了影响测量结果不确定度的4方面因素。根据实验和测量过程,分析和计算得到被测样品的线宽值、不确定度分量以及合成不确定度。 For atomic force microscope (AFM)-NanoscopeIII, the uncertainty of nano-scale linewidth measurement is analyzed. An error correction step of linewidth measurement is given, and four factors that affect linewidth measurement result are analyzed. Based on the experiment and the measurement course, width of the sample, the uncertainty components and the composed uncertainty are analyzed and calculated.
作者 褚巍 赵学增 王凌 肖增文 李洪波
机构地区 哈尔滨工业大学
出处 《计量学报》 EI CSCD 北大核心 2005年第2期120-124,共5页 Acta Metrologica Sinica
基金 哈尔滨工业大学校科研基金
关键词 计量学 纳米线宽 测量不确定度 原子力显微镜 Metrology Nano-scale linewidth Measurement uncertainty Atomic force microscope
分类号 TB92 [机械工程—测试计量技术及仪器]
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参考文献5

  • 1Misumi I, Gonda S, Kurosawa T, et al. Uncertainty in pitch measurements of one - dimensional grating standards using a nanometrological atomic force microscopy [ J ]. Measurement Science and Technology, 2003, 14: 463 - 471.
  • 2Misumi I, Gonda S, Kurosawa T, et al. Uncertainty in measurements of micro - patterned thin film thickness using nanometrological AFM - Reliability of parameters for base straight line [ A ]. Winter Topical Meeting 2003 [ C ],Gainesville, Florida: 2003, 58- 63.
  • 3Dixson R, Schneir J, McWaid T, et al. Toward Accurate Linewidth Metrology using Atomic Force Microscopy and Tip Characterization[J]. Proc SPIE, 1996, 2725:589 - 607.
  • 4赵学增,褚巍,Theodore V Vorburger,Joseph Fu,John Song,Cattien V Nguyen.基于AFM的纳米尺度线宽计量模型及其算法的研究[J].机械工程学报,2004,40(4):50-57. 被引量：7
  • 5Okada Y, Tokumaru Y. Precise determination of lattice parameter and thermal expansion coefficient of silicon between 300 K and 1500 K[J]. JAppl Phys, 1984, 2: 314-320.

二级参考文献11

  • 1Teague E G. Evaluation, revision and application of the NBS stylus/computer system for the measurement of surface roughness. National Bureau of Standards, Washington, 1976:72～79
  • 2Linholm L W, Allen R A, Cresswell M W, et al. Electrical linewidth standards for advanced lithography characterization. In:Microelectronics, MICRO, The 14th Australian Microelectronics Conference Proceedings 14, Melbourne, Australia, 1997:34～35
  • 3Koning R, Dixson R G , Fu J, et al. Step height metrology for data storage applications. In: Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks, SPIE Conference Proceedings 3806, Denver, Colorado, USA, 1999:21～28
  • 4Villarrubia J S, Dixson R G, Jones S, et al. Intercomparison of SEM, AFM, and Electrical linewidths. In: Metrol- ogy, Inspection and Process Control for Microlithography XIII, SPIE Conference Proceedings 3677, Santa Clara, California, USA, 1999:587～598
  • 5Silver R M, Potzick J E, Hu J Y. Metrology with the ultraviolet scanning transmission microscope. In:Integrated Circuit Metrology, Inspection, and Process Control IX, SPIE Conference Proceedings 2439, Santa Clara, CA, USA, 1995:437～445
  • 6Dixson R G, Koning R, Fu J, et al. Accurate dimensional metrology with atomic force microscopy. In:Metrology, Inspection and Process Control for Microlithography XIV, SPIE Conference Proceedings 3998, Santa Clara, California, USA, 2000:62～368
  • 7Gresswell M W, Allen R A, Ghoshtagore R N, et al. Characterization of electrical linewidth test structures patterned in (100) silicon-on-insulator for use as CD standards. In:Microelectronic Test Structures, ICMTS 2000 - The International Conference, Monterey, CA, USA, 2000:3～9
  • 8Minutes of the 3rd Meeting of the CCL - WGDM, http://www.cornnet.nl/～mlbroens/wg9843r.htm
  • 92001 ITRS-International Technology Roadmap for Semiconductors (2001 Edition), Metrology, The Semiconductor Industry Association, http://public.itrs.net/
  • 10Vorburger T V, Dagata J A, Wilkening G, et al. Industrial uses of STM and AFM, Annals of the CIRP (to be published)

共引文献6

同被引文献28

引证文献4

二级引证文献6

计量学报
2005年 第2期

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