摘要
本文对VHF PECVD制备的本征微晶硅薄膜和电池进行了电学特性和结构特性方面的测试分析研究。电学测试结果给出制备薄膜的激活能为0. 51eV,符合电池对材料的电学参数要求;拉曼散射谱测试结果计算得到样品的晶化率为63%;X射线衍射结果也证明材料晶化,同时(220)方向择优;首次在国内用VHF PECVD方法制备出效率为5%的微晶硅电池(Jsc=21mA/cm2, Voc=0. 46V, FF=51%, Area=0. 253cm2 )。
The electrical and structural properties of microcrystalline silicon thin film and solar cells fabricated by VHF-PECVD were studied. Photosensitivity and active energy are 1000 and 0.51eV respectively, which are suitable for the application of solar cells. The crystalline volume fraction (Xc) of thin film obtained from Raman measurement is 63%. The results of XRD measurement also indicate that the thin film is a microcrystalline silicon and has a preferable (220) orientation. Microcrystalline silicon solar cells (Jsc = 21 mA/cm2, Voc = 0.46 V, FF = 51%, Area = 0.253 cm2) with conversion efficiency 5% was fabricated by VHF-PECVD. The stability of material and solar cell were also studied.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2005年第2期297-300,共4页
Journal of Synthetic Crystals
基金
国家重点基础研究发展规划(No.G2000028202
No.G2000028203 )
教育部重点项目 (No. 02167 )
国家高技术研究发展计划(No. 2002303261)资助
