摘要
采用AFM、XRD和EDS等手段,对TiNi合金在空气中、400—800℃下形成的氧化膜组织结构进行了分析,并对TiNi合金表面原位热氧化膜的光电性能进行了研究.结果表明,TiNi合金在空气中氧化原位形成的氧化膜的结构主要为金红石型二氧化钛,不同温度下生长的氧化膜存在择优取向;随着氧化温度的升高,所制备的TiO2/TiNi电极的稳态光电流和开路光电压随氧化温度的升高先增大后减小,在700℃所制备的TiO2/TiNi电极的稳态光电流最大.
The preparation, structure and photoelectric properties of titanium oxide films formed by in-situ direct thermally oxidation of TiNi alloys were investigated by AFM, XRD, EDS and photocurrent response. The results showed that the films is rutile TiO2, and its crystal orientation is dependent on the thermal oxidation temperature. With increasing the oxidation temperature, the photocurrent and open-circuit voltage of TiO2/TiNi electrode first increased, and then decreased, when the oxidation temperature was 700°C, the photocurrent of TiO2/TiNi electrode was the highest.
出处
《感光科学与光化学》
EI
CAS
CSCD
2005年第3期161-166,共6页
Photographic Science and Photochemistry
基金
国家自然科学基金(50201016).
关键词
TINI合金
TIO2
原位热氧化
光电响应
TiNi alloy
titanium oxide
in-situ thermal oxidation
photocurrent response
