摘要
利用透射电镜研究了铁基体等离子体增强磁控溅射离子镀ＴｉＮ膜的组织和结构．在沉积ＴｉＮ之前先镀一层极薄的钛中间层，继之再沉积ＴｉＮ．研究结果表明：在基体和中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处α－Ｔｉ与Ｔｉ＿２Ｎ有结构匹配关系；靠近中间层的后继膜由Ｔｉ＿２Ｎ和ＴｉＮ两相组成；而远离中间层的后继膜部分是ＴｉＮ组成的．
Microstructures of the TiN film deposited on the iron substrate by plasma enhancedmagnetron sputter ion plating have been investigated by means of the Transmission ElectronicMicroscope,Athin Ti layer is first coated as an intermediate layer on the iron substrate and thenfollowed by TiN layer by means of plasma enhanced magnetron sputter ion plating. The resultsindicate that there exists FeTi phase in the interface , and that there also exists crastallographicorientation relationship among α-Ti and Ti_2N in the contacting area between the Ti intermediatelayer and the following TiN film. Moreover,the following film near the intermediate layerconsists of Ti_2N and TiN ,and the part of the following film far from the intermediate layerconsists of TiN only.
出处
《大连理工大学学报》
CAS
CSCD
北大核心
1995年第1期68-73,共6页
Journal of Dalian University of Technology
基金
三束材料改性国家重点实验室资助项目
关键词
等离子体
氮化钛
磁控溅射
离子镀
透射电镜
膜
plasma
medification
titanium nitride
microstructure/magnetron sputtering
