摘要
测得１１０ｋｅＶ５６Ｆｅ１＋离子注入麦胚中的射程为２５７．１ｎｍ．根据测得的５６Ｆｅ１＋离子相对浓度随深度的分布和注入离子的总面密度，求得了５６Ｆｅ１＋离子绝对浓度随深度的分布．采用ＴＲＩＭ８８程序计算得到了不同深度上注入离子的阻止本领，从而求得了随深度的能量沉积分布．并讨论了细胞损伤的可能机理。
A range of 257.1nm was measured for the 110 keV 56Fe1+ ions in wheat embryo.With measured longitudinal distribution of 56Fe1+ relative concentration and total density of the implanted ions,longitudinal view of 56Fe1+ absolute concentration was obtained.Using TRIM 88 programme,stopping power of implanted ions at different depth was calculated,and then longitudinal distribution of energy deposition was drawn.Finally,possible mechanism of cell damage was briefly discussed.
出处
《核技术》
CAS
CSCD
北大核心
1995年第2期81-84,共4页
Nuclear Techniques
基金
国家自然科学基金
关键词
离子注入
小麦
能量沉积
诱变育种
Ion implantation,Rutherford back scattering(RBS),Stopping power,Energy deposition
