期刊文献+
任意字段
题名或关键词
题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

Research and development of VUV optical coatings for micro mirror applications 被引量：4

Research and development of VUV optical coatings for micro mirror applications
下载PDF
导出
摘要 This paper deals with vacuum UV optical coatings for micro mirror applications. High reflecting low-stress optical coatings have been developed for the next-generation of micro mechanical mirrors. The optimized metal systems are applicable in the VUV spectral region and can be integrated in the technology of MOEMS, such as spatial light modulators (SLM) and micro scanning mirrors. This paper deals with vacuum UV optical coatings for micro mirror applications. High reflecting low-stress optical coatings have been developed for the next-generation of micro mechanical mirrors. The optimized metal systems are applicable in the VUV spectral region and can be integrated in the technology of MOEMS. such as spatial light modulators （SLM） and micro scanning mirrors.
作者 Alexandre Gatto Norbert Kaiser
机构地区 Fraunhofer IOF
出处 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期465-470,共6页 Optics and Precision Engineering
关键词 VUV 光学涂覆技术 微镜技术 薄膜 调节器 vacuum UV thin film micro mirror spatial light modulator
分类号 TH744 [机械工程—光学工程] TP214 [自动化与计算机技术—检测技术与自动化装置]
  • 相关文献

参考文献12

  • 1M.Rothschild,A.R.Forte,R.R.Kunz,S.C.Palmateer,J.H.C.Sedlacek.Lithography at a wavelength of 193 nm[J].IBM J.Res.Develop,1997,41:49-54.
  • 2M.Rothschild.Photolithography below 200 nm[J].SPIE,1998,3274:222-225.
  • 3M.Rothschild,T.M.Bloomstein,J.E.Curtin,et al.157 nm: Deepest deep-ultaviolet yet[J].J.Vac.Sci.,Technol.,1999,B17:3262-3266.
  • 4U.Ljungblad,U.Dauderstdt,P.Dürr,et al.New laser pattern generator for DUV using spatial light modulator[J].Microelectronic Engineering,2001,57-58:23-29.
  • 5T.Sandstrm,U.B.Ljungblad,P.Dürr,et al.High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation[J].SPIE,2001,4343:35.
  • 6D.Dudley,W.Duncan,J.Slaughter.Emerging digital micromirror device (DMD) applications[J].SPIE,2003,4985:14-25.
  • 7R.Thielsch.Optical coatings for the DUV/VUV(Ads.)[J].Springer Series in Optical Sciences,2003,88:257-279.
  • 8E.T.Hutcheston,G.Hass,J.T.Cox.Effect of deposition rate and substrate temperature on the vacuum ultraviolet reflectance of MgF2- and LiF- overcoated aluminium mirrors[J].Appl.Opt.,1972,11:2245-2248.
  • 9HASS G.Reflectance and preparation of front-surface mirrors for use at various angles of incidence from the ultraviolet to the far infrared[J].J.Opt.Soc.Am.,1982,72:27-39.
  • 10J.Heber,A.Gatto,N.Kaiser.Spectrophotometer in the vacuum UV[J].SPIE,2002,4932:544-548.

同被引文献38

  • 1胡台光,吴爱清,刘秋华.光可变衰减器[J].光通信研究,1993(1):22-26. 被引量：3
  • 2袁琼雁,王向朝,施伟杰,李小平.浸没式光刻技术的研究进展[J].激光与光电子学进展,2006,43(8):13-20. 被引量：16
  • 3申高,檀慧明,刘飞.全固态355nm连续紫外激光器的优化设计[J].光学精密工程,2006,14(5):731-735. 被引量：22
  • 4方伟,王玉鹏.紫外辐照对绝对辐射计锥腔吸收率的影响[J].光学精密工程,2006,14(5):775-780. 被引量：12
  • 5Russ DeLong, CERAC Coating Materials News [R]. 2002, 12(2):1-4
  • 6N. Kaiser, H. Uhlig, U. B. Schallenberg et al.. High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers [J]. Thin Solid Films, 1995, 260:86-92
  • 7J. Heber, R. Thielsch, H. Blaschke et al.. Changes in optical interference coatings exposed to 193 nm excimer laser radiation [C]. SPIE, 1999, 3578:83-96
  • 8R. P. Walker. The European UV/VUV storage ring FEL project at ELETTRA [R]. Proceedings of EPAC 2000, Vienna, Austria, 93-97
  • 9Ming-hong Yang, Alexandre Gatto, Norbert Kaiser. Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range [J]. Appl. Opt., 2006, 45(1): 178-183
  • 10'J. Kolbe, H. Kessler, T.Hofmann et al.. Optical properties and damage thresholds of dielectric UV/VUV coatings deposited by conventional evaporation, IAD, and IBS[C]. SPIE, 1992, 1624:435-446

引证文献4

二级引证文献25

光学精密工程
2005年 第4期

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部