摘要
采用浮动块研磨抛光机,研究中等粒度纳米金刚石抛光液用于硬盘磁头抛光时其颗粒大小及其悬浮液的分散稳定性与磁头表面质量的关系,以及抛光各工序、运行参数与表面质量的关系。磁头表面质量采用原子力显微镜观测分析。通过对抛光过程运行参数的正交实验,对中等粒度纳米金刚石用于磁头抛光的工艺过程进行优化。实验结果表明:磁头表面粗糙度随着金刚石粒径的减小而减小,但二者并不呈线性关系;抛光液的分散稳定性比抛光液颗粒粒径更能影响表面划痕的深度;精研磨能有效去除表面划痕;而抛光能有效降低表面粗糙度,但其对划痕的消除不如精磨有效;各参数对表面粗糙度和划痕的影响程度不同,但是优化后参数取值相同。
With the float-pieces polisher, the effect of the stability of polishing slurries and the nanodiamond particle size on the surface quality of magnetic head was studied. The relationship between polishing procedure and the surface quality was analyzed. The surface quality of magnetic head was observed and analyzed with atomic force microscope （AFM）. With the orthogonal experiment method, the polishing parameters were optimized. The results show that the smaller the nanodiamond size, the smaller the average surface roughness value Ra. The depth of nick is affected more obviously by the stability of the slurry than by the particle size in the slurry. The deep nick can be erased by fine lapping effectively, while Ra can be reduced effectively by fine polishing. The effect of polishing parameters on Ra is different from that on the nick, but they have the same optimized values.
出处
《中南大学学报（自然科学版）》
EI
CAS
CSCD
北大核心
2005年第4期610-614,共5页
Journal of Central South University:Science and Technology
基金
国家自然科学基金资助项目(50390061)
关键词
纳米金刚石
悬浮液
磁头
抛光
nanodiamond
slurry
magnetic head
polishing
