摘要
本文报道了采用紫外光刻和离子束刻蚀方法制作位相型Ｒｏｎｃｈｉ光栅的工艺技术，并对其衍射特性进行了讨论，同时给出实验结果。
A phase Ronchi grating was fabricated by ultraviolet lithographing and ion beam etching. The experimental results of this grating with wavelength of 632.8 nm are given, and the diffraction characteristics of the Ronchi grating discllssed.
出处
《量子电子学》
CSCD
1995年第2期146-149,共4页
