摘要
本文叙述了化学气相沉积（ＣＶＤ）金刚石薄膜过程中，金刚石在光滑非金刚石衬底表面的成核行为，讨论了目前用于提高金刚石成核密度的一些典型方法的优点和不足。
The diamond nucleation action on the smooth surface of non-diamond sub-strates during the CVD diamond films formation iS introduced.The advantagesand disadvantages of some typical methods presently used to increase diamondnucleation density are discussed.
出处
《微细加工技术》
1995年第4期43-46,共4页
Microfabrication Technology
