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玻璃衬底上MIUC Poly-Si TFT显示驱动电路 被引量:5

Display Driving Circuits Made with MIUC Poly-Si TFTs on Glass Substrate
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摘要 以高性能的金属诱导单一方向横向晶化多晶硅薄膜晶体管(MIUCpoly-SiTFT)为基础,研制出性能能满足AM-LCD和AM-OLED要求、版图和象素尺寸适配、制备工艺和象素电路兼容的多晶硅TFT行扫描和列驱动电路.该行扫描电路工作电压为3.5-10V;当工作电压为5V、负载电容为22pf时,下降沿约为150ns,上升沿约为205ns,最高工作频率在1MHz以上;列驱动电路工作电压为3.5-8V;当工作电压为5V、负载电容为22pf时,上升沿约为200ns,信号衰减率为15%(64μs扫描周期),最高工作频率达到4MHz.将该MIUCpoly-SiTFT多晶硅行扫描、列驱动电路和有源选址电路集成到同一基板上,制备出象素数为80×RGB×60、动态显示效果良好的全集成型LCD屏样品. Based on metal induced unilateral crystallization (MIUC) technology,poly-Si thin film transistor (poly-Si TFT) display scan driving circuit and data driving circuit for AM-LCD and AM-OLED were developed,which can be made with the fabrication processes compactable with poly-Si TFT active matrix.The scan driver can work within the driving voltage from 3.5V through 10V. When it works at the driving voltage of 5V and the loading capacity of 22pf, the fall time and the rise time of the scanning circuit is about 150ns and 205ns respectively, the maximum working frequency is higher than 1MHz. Meanwhile, the data driving circuit can work within the voltage from 3.5V through 8V. Its rise time is about 200ns,its signal degradation ratio is about 15% during a period of 64μs,and the corresponding maximum working frequency is about 4MHz,when the data driving circuit work at the biased voltage of 5V and the loading capacity of 22pf. Using those MIUC poly-Si TFT display drivers, a self scanned active matrix LCD with pixel number of 80 × RGB × 60 was demonstrated.
出处 《电子学报》 EI CAS CSCD 北大核心 2005年第8期1349-1352,共4页 Acta Electronica Sinica
基金 国家自然科学基金(No:60437030) 国家"863"平板显示专项(No:2004AA303570) 国家出国留学人员回国基金和香港RGC的资助
关键词 金属诱导单一方向横向晶化 多晶硅薄膜晶体管 显示驱动电路 全集成显示 metal induced unilateral crystallization poly-Si TFF display driver circuit display system on panel
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参考文献9

  • 1Lih J J,et al. Comparison of a-Si and poly-Si for AMOLED[A].SID 2004 Digest [C].Seattle:Society of Information Display,2004.1504-1507.
  • 2Matsueda Y,et al.2.5-in. AMOLED with integrated 6-Bit gamma compeneated digital data driver[A]. SID 2004 Digest[C].Seattle: Society of Information Display,2004.1116 - 1117.
  • 3Ikeda T, et al. Full-functional system liquid crystal display using CG-silicon technology[ A ].SID 2004 Digest[ C]. Seattle: Society a Information Display,2004. 860 - 863.
  • 4Nakajima Y, et al. Latest development of "system-on-glass" display with low temperature poly-Si TFF[ A ]. SID 2004 Digest [ C ]. Seattle: Society of Information Display,2004. 864 - 867.
  • 5Jin Z, et al. Nickel induced ctystallization of amorphous silicon thin films[J] .J Appl Phys, 1998,84(1) : 194- 200.
  • 6Jang J, et al. Polycrystalline silicon produced by Ni-silicide mediated crystallization of amorphous silicon in an electric field [ J ]. J Appl Phys,2000,88(5) :3099 - 3101.
  • 7Meng Z, et al. High performance low temperature metal-induced unilaterally crystallized poly-crystalline silicon thin film transistor for system-on-panel applications[J]. IEEE Trans. on Electron Devices,2000,47(2) :404 - 409.
  • 8Yoon S Y, et al. High-performance poly-Si TFTs made by Ni-mediated crystallization through low-shot laser annealing[J] .The IEEE Electron Device Letters, 2003,24(1 ) :22 - 24.
  • 9Wu C,et al.A 2.1-inch AMOLED Display based on metal-induced laterally crystallized polycrystalline silicon technology[ A ]. SID2004 Digest[ C]. Seattle:Society of Information Display,2004.1128 - 1131.

同被引文献32

  • 1孟志国,彭华君,吴春亚,李娟,熊绍珍,丘成峰,李娟娟,王文,郭海成.彩色膜上ITO的室温沉积及其在FPD中的应用[J].光电子.激光,2005,16(2):140-145. 被引量:16
  • 2赵淑云,吴春亚,李娟,刘建平,张晓丹,张丽珠,孟志国,熊绍珍.化学源金属诱导多晶硅研究[J].物理学报,2006,55(2):825-829. 被引量:7
  • 3张昱,张健.模糊专家系统在TFT-LCD缺陷检测中的应用[J].光电子.激光,2006,17(6):719-723. 被引量:10
  • 4John P Uyemura.超大规模集成电路与系统导论[M].北京:电子工业出版社,2006.
  • 5L J Hombeck. Digital Light Processing TM for high brightness, high-resolution applications [ A ]. Electronic Imaging, EI' 97, Projection Displays Ⅲ [ C]. San Jose, CA: February 10 - 12, 1997.27 -40.
  • 6D M Bloom, et al. The Grating Light Valve: revolutionizing display technology [ A ]. Electronic Imaging, EI' 97, Projection Displays Ⅲ [ c]. san Jose, CA February 10 - 12, 1997. 165 - 171.
  • 7Sun Jiyong, Huang Shanglian, et al. Two-dimensional grating light modulator for projection display [ J ]. Applied Optics. 2008,47(15) :2813 - 2820.
  • 8Jin Zhu, Wen Zhiyu, et al. Electromechanical characteristic analysis of passive matrix addressing for grating light modulator[ J]. Sensors. 2009,9(3) : 2162 - 2175.
  • 9Jin Zhu, Huang Shanglian, et al. Characteristic analysis and study of an active matrix addressing for grating light modulator [ A]. 2008 International Conference on Optical Instruments and Technology[ C ]. Beijing, China, November 16 - 19,2008. Vol 7159:71590 - 71599.
  • 10Ching-Liang Dai,Fu-Yuan Xiao,et al.An approach to fabricating microstmctures that incorporate circuits using a post-CMOS process [ J ]. J. Micromech. Microeng. 2005,15 ( 1 ) : 98 - 103.

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