摘要
利用紫外光辐照聚碳酸酯(PC)离子径迹膜,研究光辐照对于核孔膜蚀刻过程的影响。实验结果显示,紫外光照射对核孔膜的蚀刻有着重要的作用,它可以有效地增加径迹的蚀刻速率,并且径迹蚀刻速率随紫外光照时间的增加呈线性增长关系,此现象是由于光降解作用引起的。本文还介绍了用于监测核孔膜蚀刻过程的电导测量方法,利用此方法可以得出核孔膜径迹蚀刻速率、孔径随蚀刻时间变化等关系。
Nuclear track membranes offer distinct advantages over conventional membranes due to their precisely determined structure. Their pore size, shape and density can be controlled intentionally so that a membrane with the required characteristics can be produced. The track etching technology plays a most important role in the production of nuclear track membranes. The effects of pretreatment using UV light illumination on track etching of polycarbonate （PC） track membranes were investigated in this work. PC films illuminated by UV light showed a strong enhancement in the track etching rate. Furthermore, the track etching rate had a linear increase with illumination time. The phenomenon is attributed to the oxygen-assisted photo-degradation through generating new photo-unstable species. In this paper, the conductance measurement is also presented, which is a popular method, used in etching technology.
出处
《核技术》
EI
CAS
CSCD
北大核心
2005年第9期684-687,共4页
Nuclear Techniques
基金
中国科学院"西部之光"基金和国家自然科学基金(10375079)资助
关键词
核孔膜
聚碳酸酯
紫外辐照
电导法
Nuclear track membranes, Polycarbonate, UV light illumination, Conductance measurement
