摘要
报道用远紫外准分子激光进行亚微米光刻的实验结果。以波长为２４８．３ｎｍ的ＫｒＦ准分子激光为光源，以光管均匀器为主构成照明系统，采用带有平行平板为像差校正板的１１折反射式投影光刻物镜，在两种光刻胶上分别获得了０．６μｍ和０．
Experimental results of deep submicron lithography with a excimer laser are reported in this paper. With a free running KrF excimer laser, an illumination system including a light pipe uniformizer and a broadband catadioptric 1∶1 projection lens with an aberration correcting planoparallel plate, the resolutions of 0.6 μm and 0.5 μm L/S patterns are produced on two resists respectively.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1996年第8期1169-1172,共4页
Acta Optica Sinica
基金
中科院"八五"重大研究项目
关键词
准分子激光
激光光刻
亚微米
光刻物镜
半导体
excimer laser, laser lithography, submicron lithography, lithography lens
