摘要
采用磁控双靶反应共溅射技术制备出了(Ti0.5Al0.5)N耐磨硬质薄膜,其显微硬度高于35GPa,摩擦系数小于0.18。实验结果表明当N2流量较低时,(Ti,Al)N薄膜结构和性能随N2流量变化明显;当N2流量较高时,薄膜结构和性能变化缓慢。等离子体发射光谱仪(PEM)对磁控反应溅射过程监测结果表明,钛铝原子与氮原子反应存在一个临界点,低于临界点,磁控反应溅射为金属态溅射模式,高于临界点,磁控溅射向非金属态溅射模式转变,溅射速率降低。
Wear resistant coatings of （Ti0.5Al0.5） N, with a hardness of 35 GPa and a friction coefficient lower than 0.18, were deposited with double-target reactive magnetron co-sputtering on steel substrate.The coatings were characterized with X-ray diffraction（XRD） and plasma photo-emission spectroscopy. The results show that low nitrogen flow-rate considerably affects the microstructures and the hardness of the coating till it increases to a certain high value. We observed that in the reactive sputtering there exists a critical nitrogen flow rate, below which Ti and Al were deposited in metallic sputtering mode, whereas above which Ti and Al were coated in non-metallic sputtering mode but at a rather low deposition rate.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2005年第3期233-237,共5页
Chinese Journal of Vacuum Science and Technology
