摘要
作者从静电加速器用高频离子源的结构出发,通过实验台上的调试,测试并分析了振荡器板压、气压和引出电压对离子束性能的影响.结果表明,在575 V板压、7.7×10-4Pa气压、1.6 kV引出电压和21 kV聚焦电压的状态下,可得到束流为169μA、质子比为88%的稳定离子束.
The structure of RF ion source is introduced and is debugged on experimental platform. The influence of plate voltage of the oscillator, gas pressure and extraction voltage on the quality of ion beam is determined and analyzed. A stable ion beam of 169μA intensity and 88% proton ratio is obtained under the condition of 575 V plate voltage, 7.7×10^-4 Pa gas pressure, 1.6kV extraction voltage and 21kV focusing voltage.
出处
《四川大学学报（自然科学版）》
CAS
CSCD
北大核心
2005年第5期974-977,共4页
Journal of Sichuan University(Natural Science Edition)
关键词
静电加速器
离子束
离子源
束流
振荡器
electrostatic accelerator
ion beam
ion source
beam current
oscillator
