摘要
The effect of changing Be doping concentration in GaAs layer on the integrated photosensitivity for nega- tive-electron-affinity GaAs photocathodes is investigated. Two GaAs samples with the monolayer structure and the muhilayer structure are grown by molecular beam epitaxy. The former has a constant Be concentration of 1 × 10^19 cm^-3, while the latter includes four layers with Be doping concentrations of 1 × 10^19, 7 × 10^18, 4 × 10^18, and 1 × 10^18 cm^-3 from the bottom to the surface. Negative-electron-affinity GaAs photocathodes are fabricated by exciting the sample surfaces with alternating input of Cs and O in the high vacuum system. The spectral response results measured by the on-line spectral response measurement system show that the integrated photosensitivity of the photocathode with the muhilayer structure enhanced by at least 50% as compared to that of the monolayer structure. This attributes to the improvement in the crystal quality and the increase in the surface escape probability. Different stress situations are observed on GaAs samples with monolayer structure and muhilayer structure, respectively.
研究了变掺杂浓度结构对GaAs负电子亲和势光电阴极积分光电灵敏度的影响.通过MBE生长了两组GaAs同质外延样品.其中一组采用了均匀掺杂的单层结构,Be掺杂浓度为1×1019cm-3;另一组采用了变掺杂的多层结构,从衬底开始Be的掺杂浓度依次为1×1019,7×1018,4×1018和1×1018cm-3.负电子亲和势光电阴极通过在高真空系统中交替通入Cs和O激活得到.在线光谱响应测试曲线表明,多层Be掺杂结构光阴极的积分光电灵敏度比单层Be掺杂结构光阴极的积分光电灵敏度至少提高了50%.两种结构的GaAs样品表现出不同的表面应力情况.
