摘要
通过在聚酰亚胺基体中引入一定量MMT片层,可以改善薄膜的耐电老化性能,对薄膜电老化前后表面形貌及化学组成的研究结果表明:MMT片层均匀而充分的分散提高了MMT/PI薄膜的耐电弧性,这是聚酰亚胺薄膜电老化性能改善的原因。
Polyimide have been extensively employed in electrical and microelectronics industries as well as aerospace and aviation industries as advanced packaging and insulating materials owing to their outstanding combined mechanical properties, thermal stabilities and electrical insulating properties. With the rapid development of advanced industry, polyimide films with high property and unique function are usually required. Therefore, researches have been done to improve the properties of polyimide film by introducing different inorganic particles. MMT/ PI hybrid films were prepared by incorporation with different content of MMT via an in-situ intercalationpoly- merization pathway. The XRD and TEM results indicated that the silicates are homogeneously dispersed as exfoliated layers in the PI hybrid film with 2% of silicate content. The electrical aging performance of PI hybrid film could also be improved as the silicate layer highly dispersed in the film.
出处
《绝缘材料》
CAS
2005年第5期31-34,共4页
Insulating Materials
关键词
聚酰亚胺
薄膜
MMT
击穿破坏
polyimide
hybrid film
montmorillonite
electrical breakdown
