摘要
Knowledge of the structure of thin oxide films is very important for electrochemistry, microelectronics and catalyses. Supported oxide catalysts （supported thin oxide films） are used extensively in the petroleum, chemical and pollution control industries as catalysts for a wide range of chemically important transformations. They are industrially used for sulfuric acid manufacture, oxidation of o-xylene to phthalic anhydride, ammoxidation of alkylaromatics to aromatic nitriles, selective catalytic reduction of environmentally undesirable NOx emissions from electric power plants to N2 with NH3 and oxidative destruction of persistent bioaccumulative toxic dioxins from emissions of incinerators. This wide range of catalytic applications reflects the versatile activity/selectivity characteristics of oxide catalysts that have their origins in the variability of the molecular structures and electronic properties of the active sites forming on the oxide surface. Therefore, detailed knowledge of the molecular structure and electronic structures of surface thin oxide films, their active sites and their corresponding reactivity/selectivity relationships are the critical fundamental information that is necessary for the molecular engineering of active surface oxide species for specific catalytic applications.
Knowledge of the structure of thin oxide films is very important for electrochemistry, microelectronics and catalyses. Supported oxide catalysts （supported thin oxide films） are used extensively in the petroleum, chemical and pollution control industries as catalysts for a wide range of chemically important transformations.
出处
《光散射学报》
2005年第3期287-288,共2页
The Journal of Light Scattering
