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第四届超临界流体技术用于能源、环境和电子学国际会议简介 被引量：1

Introduction of the 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications
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摘要 对第四届超临界流体技术用于能源、环境和电子学国际会议进行了简介和分析,重点介绍了近年来超临界流体技术用于能源、环境和电子学方面的最新进展。 The 4th International Symposium on Supercritical Fluid Technology for Energy, Environment and Electronics Applications was introduced in this report. Progresses on supercritical fluid technology for energy, environment and electronics applications in recent years was described, respectively.
作者 苏磊
机构地区 西南交通大学高温高压物理研究所
出处 《高压物理学报》 CAS CSCD 北大核心 2005年第4期390-392,共3页 Chinese Journal of High Pressure Physics
关键词 超临界流体 能源 环境 电子学 supercritical fluid technology energy environment electronics
分类号 TQ028.3 [化学工程]
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参考文献23

  • 1Han B X.Study on Supercritical Fluides:Thermodynamics,Applications in Chemical Reactions and Material Processing [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 2Chen Y P.Recrystallization and Micronization of Pharmaceuticals Using the Continuous Supercritical Anti-Solvent (SAS) Process [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 3Tang S K,Li S F.Study on Process for Extraction of Medicinal Ingredients Procyanidins from Red Grape Seeds with Supercritical Carbon Dioxide [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 4Liang M T,Ho C Y,Chang C J,et al.Separation of Aqueous Isopropanol by Supercritical CO2 Fractionation [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 5Yoo K P.Process Development of SCORR for Pattern Wafers [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 6Ling Y C.A Green Method to Remove Organic Residue from Photoresist Etching via Oxidative Degradation in Supercritical Carbon Dioxide [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 7Tan C S,Ting Y B.Removal of Photoresist by CO-Based Fluids in Different Operations [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 8Chang Y P,Su C S,Chen Y P.Recrystallization and Micronization of Pharmaceuticals Using the Continuous Supercritical Anti-Solvent (SAS) Process [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 9Lee Y W.Formation of Nano Particles in Supercritical Fluids [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.
  • 10Wai C M.Nanoparticle Catalysts for Chemical Synthesis in Supercritical Carbon dioxide [A].The 4th International Symposium on Supercritical Fluid Technology for Energy,Environment and Electronics Applications [C].Taipei,2005.

同被引文献9

引证文献1

高压物理学报
2005年 第4期

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