摘要
简要介绍了用于电子束物理气相沉积的设备及其发展,阐述了利用该技术制备微层材料的优点,同时对制备工艺和相应的材料性能作了详细的介绍,并指出使用电子束物理气相沉积技术制备微层材料具有广阔的发展前景。
The facility used for electron beam physical vapor deposition （ EB - PVD） and its development are briefly introduced. The advantages of preparing microlaminated materials by this technology are stated, and the preparation processes and the relevant material performances are introduced in detail. The broad development prospect of this preparation technology is indicated.
出处
《宇航材料工艺》
CAS
CSCD
北大核心
2005年第6期13-16,共4页
Aerospace Materials & Technology
基金
国家自然科学基金(90205034)
