摘要
采用直流磁控溅射方法,以Ar/N2作为放电气体在玻璃基片上沉积了单相γ-′Fe4N薄膜,采用X射线衍射(XRD)和超导量子干涉仪(SQUID)对所制备的样品进行了结构和磁性性能分析,研究了基片温度对薄膜的结构和磁性性能的影响。
The single- phase γ-Fe4N thin films are deposited on glass substrates by DC magnetmn sputtering using an Ar/N2 gas mixture. The structure and magnetic properties of the films are characterized using X- ray diffraction （XRD） and superconducting quantum interference device （SQUID）. The effects of substrate temperature on the structures and magnetic properties of the thin films are investigated.
出处
《长春大学学报》
2005年第6期46-47,共2页
Journal of Changchun University
基金
吉林省科技厅科研项目(20050415-2)
关键词
基片温度
FE-N薄膜
结构
磁性
substrate temperature
Fe- N thin films
structure
magnetic properties
