摘要
提出了一种激光诱导液相腐蚀新方法———次序选择腐蚀法。次序选择腐蚀是指在激光化学液相腐蚀中,腐蚀溶剂不是混合后同时作用于基片,而是按照溶剂的性能,分先后对基片进行腐蚀。实质上是采用微处理(表面处理)再进行混合液相激光辅助下的腐蚀。理论分析和实验结果都表明,与国内外研究普遍采用的混合溶剂腐蚀法相比,次序选择腐蚀可以有效地提高腐蚀表面的均匀性;因先采用H2O2对基片进行化学腐蚀处理,大大缩短了激光化学腐蚀的时间;利用溶剂分开,降低了激光化学腐蚀对混合溶剂精确配比的要求,使激光化学腐蚀控制和分析更加简单。这种方法可以克服常规方法的诸多弊端,提高腐蚀性能,在特殊结构光电器件和光电集成中具有广泛的应用前景。
A new method-laser-assisted wet order-selective-etching is proposed. This method is defined as that the suhstrate is etched by reagents respectively according to their, performance rather than mixed reagents in laser induced wet chemical etching. Theoretical analysis and experimental results show that compared with the mixedreagent-etching, this method smoothes the etched surface effectively. Disposing the substrate with H2O2 firstly shortens the time of laser induced wet chemical etching, and the separation of reagents lowers the requirement of configuration accuracy of the mixed reagent, which simplify the method of controlling and analyzing laser induced wet-chemical etching. For the above reasons, the laser-assisted wet order-selective-etching overcomes disadvantages of conventional ones, improves the laser-etching performance and is of wide use in the fabrication of specialstructured opto electronic devices and the opto-electronic integration.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2006年第1期49-52,共4页
Chinese Journal of Lasers
基金
国家自然科学基金(60277008)
教育部重点项目(03147)
电科院资助
四川省科技厅资助(04GG021-020-01)
国防科技重点实验室基金(514910501005DZ0201)资助课题
关键词
激光技术
激光辅助腐蚀
次序选择腐蚀法
光电子
半导体化合物
laser technique
laser assisted etching
order selective etching method
optical electronic
semiconductor compound
