摘要
综述了铟锡氧化物(ITO)薄膜的生产技术概况及其发展趋势。介绍了ITO薄膜的主要制备技术的制备原理,包括磁控溅射法、溶胶-凝胶法、化学气相沉淀法、喷雾热分解法及真空蒸发法等5种制膜工艺,并对其优缺点进行了分析。指出ITO薄膜生产技术的发展趋势为:1)大力开发溶胶-凝胶工艺;2)进一步深入研究其合成机理与性能;3)拓宽应用领域;4)开发先进的薄膜制备工艺技术。
The technology survey and development tendency of ITO films were reviewed. The preparation principles of the main production processes of ITO films were introduced, including DCMS, CVD, Sol-gel process, chemical vapor deposition, spray-pyrolysis and vacuum evaporation, and their merits and demerits were analyzed. Based on the analysis results, the development tendency of production technology of ITO thin film are investigated as follows ： （ 1 ） Developing the sol-gel process strongly ; （2） Further studying their synthesis mechanism and properties ; （3） Exploiting their application area; （4） Developing advanced preparation technology of thin film.
出处
《表面技术》
EI
CAS
CSCD
2006年第1期1-4,共4页
Surface Technology
基金
国家自然科学基金资助项目(20306031)
