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磁控溅射法制备CeO_2-TiO_2紫外吸收薄膜 被引量:4

Prepartation of CeO_2-TiO_2 Thin Films for UV Absorbing by RF Sputtering
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摘要 采用射频磁控溅射在玻璃基片上沉积具有紫外吸收CeO2-TiO2混和薄膜。通过制备一系列不同物质的量浓度比的,n(CeO2):n(TiO2)靶材(1.0:0,0.90:0.10,0.80:020,0.70:0.30,0.60:0.40,0.50:0.50,0.40:0.60,0.30:0.70,0.20:0.80,0.10:0.90,0:1.0),研究其紫外吸收性能最佳的物质的量浓度比:TiO2加入CeO2后,改变CeO2的结晶状态并提高UV吸收.采用Raman和XPS表征薄膜的特性,物质的量浓度比值在n(CeO2):n(TiO2)=0.5:0.5,0.6:0.4时,薄膜为非晶态,并具有高的紫外吸收(98%)和可见光透过率(70%-80%);XDS分析表明薄膜存在(F^4+,Ce^3+和Ti^4+。 Ultraviolet ray (UV) absorbing coating consisting of a complex oxide of cerium andtitanium was deposited on glass substrates by RF sputtering. These films were deposited at different molar ratio CeO2-TiO2 targets of ,CeO2 to TiO2 (1.0:0,0.90: 10,0.80:0.20,0.70:0.30, 0.60:0.40, 0.50:0.50, 0.40:0.60, 0.30:0.70, 0.20:0.80,0.10:0.90,0: 1.0). Addition of TiO2 to CeO2 changed the crystallinity and coordination state of CeO2 and improved UV absorption. These films were characterized by Raman spectroscopy, and X-ray photoelectron spectroscopy and spectrometer. The amorphous phases composed of n (CeO2) : n (TiO2) (0.6:0.4,0.5:0.5) played an important role in absorbing UV(98% )with high visible light (70% -80% ). XPS analysis indicated that tetravalent Ce^4+ ,Ti^4+ and trivalenee Ce^3 + were present in the films.
出处 《武汉理工大学学报》 CAS CSCD 北大核心 2006年第1期7-9,12,共4页 Journal of Wuhan University of Technology
基金 国家"863"计划(20002AA335030)
关键词 CeO2-TiO2薄膜 UV吸收 磁控溅射 CeO2-TiO2 thin films: UV absorption RF
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参考文献5

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二级参考文献1

  • 1杜新华,材料研究学报

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