摘要
概述了半导体制造中清洗技术所面临的挑战及生产中存在的问题,分析了解决问题的途径,讨论了当前IC制造中关键清洗技术的发展方向。对于国产清洗设备制造业的发展提出了自己的看法。
The new challenge and issues of the cleaning technique in IC manufacturing are introduced. The ways for solving the problems are analyzed, and the key techniques developing trends are discussed. Suggestions for developing cleaning equipment were proposed.
出处
《半导体技术》
CAS
CSCD
北大核心
2006年第3期166-169,共4页
Semiconductor Technology
关键词
IC制造
清洗技术
挑战
IC manufacture
cleaning technique
challenge
