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用锌有机源和CO_2/H_2混合气源PECVD沉积ZnO薄膜 被引量:4

ZnO Thin Films Prepared by PECVD from Mixture Sources of Metalorganic Zinc and Carbon Dioxide-Hydrogen Gas
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摘要 在等离子体作用下,以CO2/H2混合气为氧源,Zn(C2H5)2锌为锌源,在单晶硅上生长出高度择优取向的氧化锌薄膜。X射线衍射分析表明,薄膜为六方结构,c轴高度择优;原子力显微镜观察到晶粒是有规律地按六方排布,薄膜的表面粗糙度较小;从光致发光谱还发现在380 nm处有非常强的紫外峰。 ZnO films are prepared by plasma enhanced chemical vapor deposition (PECVD), using carbon dioxidehydrogen gas and diethylzinc gas as reactant sources. Carbon dioxide reacts with hydrogen in the plasma charmer to produce oxygen source. Crystallographic properties and surface morphology of the films are characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results indicate that the wurtzite structure of ZnO thin films with a strong c-axis orientation is successfully deposited on Si substrate. AFM images show that the grains arrange regularly and roughness of the surface is very small. A type emission peak at 380 nm of ZnO is also observed from photoluminescence (PL) spectrum.
出处 《光学学报》 EI CAS CSCD 北大核心 2006年第4期639-640,共2页 Acta Optica Sinica
基金 江西省自然科学基金(0120024) 江西省材料中心基金 江西省教育厅(赣教技字[2005]160号)资助课题
关键词 薄膜光学 ZNO 等离子体增强化学气相沉积 thin film optics ZnO plasma enhanced chemical vapor deposition (PECVD)
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  • 2孙贤开,林碧霞,朱俊杰,张杨,傅竹西.LP-MOCVD异质外延ZnO薄膜中的应力及对缺陷的影响[J].物理学报,2005,54(6):2899-2903. 被引量:16
  • 3傅广生,孙伟,吕雪芹,王春生,尹志会,于威.自然掺杂及N-Al共掺杂ZnO薄膜的发光特性[J].中国激光,2006,33(4):549-551. 被引量:4
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