2Levenson M D. Wavefront engineering from 500 nm to 100 nm CD [J]. Proc SPIE,1997; 3051: 2-13.
3Wong A K. Resolution enhancement techniques in optical lithography [M]. SPIE Press. 2001.
4Mack C. Optimum stepper performance through image manipulation [I]. Proc KTI Microelectronics Seminar [C]. 1989. 209-215.
5Shiraishi N. Hirukawa S, Takeuchi Y, et al. New imaging technique for 64M-DRAM [J]. Proc SPIE,1992, 1674: 741-752.
6Brueck S R J, Chen X-L. Spatical frequency analysis of optical lithography resolution enhancement technques [J]. Proc SPIE,1999; 3679: 715-725.
7Noguchi M, Muraki M, Iwasaki Y, et al. Subhalf micron lithography with phase-shifting effect [J]. Proc SPIE,1992; 1674: 92-104.
8Ahn C N, Balk K H, Lee Y S, et al. A study of optical proximity effects using off-axis illumination with attenuated phase-shift mask [J]. Proc SPIE, 1995;2440 : 222-239.
9Brooker P. Roles of NA, sigma and lambda in low aerial image formation [J]. Proc SPIE, 2001; 4346:1575-1586.
10WONG A K.Resolution enhancement techniques in optical lithography [M].Bellingham: SPIE Press,2001.
