摘要
中心遮拦干涉图的圆Zernike多项式拟合存在交叉耦合现象,进而影响到Seidel像差的计算。利用干涉仪数据处理软件提供的Mask功能构造出一系列不同遮拦比的中心遮拦干涉图并计算出其圆Zernike拟合系数,结合自编软件判断出被测非球面镜的中心遮拦比对于5项Seidel像差是否达到阈值,给出了具体的实现流程,并对口径为700 mm、中心遮拦比为0.23的抛物面主镜进行了实验研究。分析结果表明,该优化分析方法简单易行,基于标准干涉数据处理软件,无需编写复杂的数据格式转化和多项式拟合程序,即可得到相对较准确的Seidel像差估计值。
Because of the coupling that exists in obscuration interferogram fitted with Zernike circle polynomials, the Seidel aberrations computed with Zernike coefficients will be inaccurate. Based on the ＂Mask＂ function provided by interferometric reduction software, a series of obscuration interferograms with different obscuration ratio are constructed, and the corresponding coefficients fitted with Zernike circle polynomials are calculated. Combining with own software, whether the obscuration ratio of the tested aspherical mirror is beyond the threshold for every Seidel term is estimated, and the operating flow is provided in detail. We tested and analyzed a 700 mm paraboloid primary mirror with 0.23 obscuration. The experimental results show the optimum method is simply feasible, and the estimated values of Seidel aberrations are more accurate. There needn＇t the complicated data conversion and polynomials fitting in own software, based on the standard interferometric reduction software.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2006年第5期568-572,共5页
Journal of Optoelectronics·Laser
