摘要
利用对向靶溅射,同时对基片进行退火处理的方法,在玻璃基片上成功地制备出了NdFe7-xMox(x=0,0.5)薄膜,并对其进行了磁性研究。VSM测量结果表明,Mo掺入导致了材料矫顽力Hc的增大,却相应降低了饱和磁化强度Ms。随着退火温度T的提高,Hc随之增大,当T=573K时,出现一极大值为37.8kA/m,此时的热磁测量表明,样品具有最高居里温度,Tc=775K。
The NdFe7-xMox (x=0, 0. 5) films have been synthesized on the glass by facing-target sputtering, while the substrates are held at different annealing temperatures. We have investigated the sample's magnetism by VSM,and found that the coercivity,Hc,increases because some of the Fe atoms are substituted by Mo atoms,and the saturation magnetization Ms decreases relatively. The results show that Hc is improved as the annealing temperature increases,and at T= 573 K, Hc has a maximum value of 37. 8 kA/m. The thermomagnetic measurement shows that this sample has the highest Curie temperature,Tc=775 K.
出处
《真空科学与技术》
CSCD
1995年第6期379-382,共4页
Vacuum Science and Technology
关键词
对向靶溅射
退火温度
矫顽力
金属互化物
薄膜
Facing-target sputtering, Annealing temperature, Coercivity, Saturation magnetization